M.Koh, T.Goto, A.Sugita, T.Tanii, T.Iida, T.Shinada, T.Matsukawa, I.Ohdomari: Novel Process for High-Density Buried Nanopyramid Array Fabrication by Means of Dopant Ion Implantation and Wet Etching, Jpn. J. Appl. Phys. 40, 2001, 2837.

T.Tanii, T.Goto, T.Iida, M.Koh-Masahara, I.Ohdomari: Simple Fabrication of Silicon Nanopyramids for High Performance Field Emitter Array, Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials, 2001, 578.

T.Tanii, T.Goto, T.Iida, M.Koh-Masahara, I.Ohdomari: Fabrication of Adenosine Triphosphate-Molecule Recognition Chip by Means of Bioluminous Enzyme Luciferase Jpn. J. Appl. Phys. 40, 2001, L1135.

M.Masahara, T.Matsukawa, K.Ishii, Y.Liu, M.Nagao, H.Tanoue, T.Tanii, I.Ohdomari, S.Kanemaru, E.Suzuki: Novel Nanoprocess for Vertical Double-Gate MOSFET Fabrication by Ion-Bombardment-Retarded Etching, Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials, 2002, 426.

M.Masahara, T.Matsukawa, K.Ishii, Y.Liu, M.Nagao, H.Tanoue, T.Tanii, I.Ohdomari, S.Kanemaru, E.Suzuki: Fabrication of ultrathin Si Channel Wall For Vertical Double-Gate Metal-Oxide-Semiconductor Field-Effect Transistor (DG MOSFET) by Using Ion-Bombardment-Retarded Etching (IBRE), Jpn. J. Appl. Phys. 42, 2003, 1916.

G.-J.Zhang, T.Tanii, T.Zako, T.Funatsu, I.Ohdomari: The immobilization of DNA on microstructured patterns fabricated by maskless lithography, Sens. & Actuat. B 97, 2004, 243.

G.-J.Zhang, T.Tanii, T.Funatsu, I.Ohdomari: Patterning of DNA Nanostructures on Silicon Surface by Electron Beam Lithography of Self-Assembled Monolayer, Chem. Commun., 2004 786.

T.Tanii, T.Hosaka, T.Miyake, G.-J.Zhang, T.Zako, T.Funatsu, I.Ohdomari: Preferential Immobilization of Biomolecules onto Silicon Microstructure Array by Means of Electron Beam Lithography onto Organosilane Self-Assembled Monolayer Resist, Appl. Surf. Sci. 234, 2004, 102.

D.Ferrer, T.Shinada, T.Tanii, J.Kurosawa, G.Zhong, Y.Kubo, S.Okamoto, H.Kawarada, I.Ohdomari: Selective Growth of Carbon Nanostructures on Nickel Implanted Nanopyramid Array, Appl. Surf. Sci. 234, 2004, 72.

G.-J.Zhang, T.Tanii, T.Miyake, T.Funatsu, I.Ohdomari:Attachment of DNA to Microfabricated Arrays with Self-Assembled Monolayer, Thin Solid Films 464, 2004, 452.

M.Tanaka, T.Hosaka, T.Tanii, I.Ohdomari, H.Nishide: Selective Deposition of Polystyrene Nano-particles in the Nanoetchpit-Array on a Silicon Substrate, Chem. Commun., 2004, 978.

T.Tanii, T.Hosaka, T.Miyake, I.Ohdomari: Electron Beam Lithography on Organosilane Self-Assembled Monolayer Resist, Jpn. J. Appl. Phys. 43, 2004, 4396.

T.Tanii, T.Hosaka, T.Miyake, Y.Kanari, G.-J.Zhang, T.Funatsu, I.Ohdomari: Hybridization of Deoxyribonucleic Acid and Immobilization of Green Fluorescent Protein on Nanostructured Organosilane Templates, Jpn. J. Appl. Phys. 44, 2005, 5851.

T.Tanii, S.Fujita, Y.Numao, I.Matsuya, M.Sakairi, M.Masahara, I.Ohdomari: A Novel Process for Fabrication of Gated Silicon Field Emitter Array Taking Advantage of Ion Bombardment Retarded Etching, Jpn. J. Appl. Phys. 44, 2005, 5191.

G.-J.Zhang, T.Tanii, T.Zako, T.Hosaka, T.Miyake, Y.Kanari, T.Funatsu, I.Ohdomari: Nanoscale Patterning of Protein Using Electron Beam Lithography of Organosilane Self-Assembled Monolayers, small 1, 2005, 833.